Voltage control is one of the process control methods that adjusts the reactive gas flow in the TH Series inline sputter glass coating system to keep the target sputtering voltage at the required operating point. This is useful for reactive sputtering materials with a pronounced hysteresis response, such as silicon (Si) and aluminum (Al).

• Suitable for hysteresis materials: Provides effective process control for reactive sputtering materials such as Si and Al. The operating state can shift rapidly within the hysteresis region.
• Stable process conditions: Reactive gas flow is constantly adjusted so that the sputtering voltage remains at the target operating point to ensure that the film deposition stays stable during production.
• High deposition rate: Maintains a high deposition rate that leads to lower energy consumption and a reduced number of cathodes needed for a specific production capacity.
• Controlled optical properties: Provides control over the optical constants n and k to maintain consistent optical properties of the deposited film.