Planar Cathode
Planar cathodes are key components in magnetron sputtering coating lines, primarily used for depositing metallic thin films onto glass. Cathode configuration — including target size and target-to-substrate distance — can be matched to the coating line. Magnetic field adjustment is available in three modes: atmospheric, vacuum manual, and vacuum online.
- Magnetic Field Design: Improves target utilization and coating uniformity
- Vacuum Adjustment Options: The magnetic field can be adjusted manually under vacuum or online via the host computer, without breaking vacuum.
Working Principle
As targets erode during sputtering, magnetic field distribution shifts and coating uniformity can worse. Operators can correct the field without breaking vacuum or stopping the line — manually at the planar cathode or in sections via the supervisory control system.
Features
- Magnetic Field System
The system uses a saddle-shaped magnetic field design to achieve a highly uniform field distribution, improving target utilization and maintaining stable sputtering. - Cooling System
An integrated cooling circuit allows the cathode to run at high power density. As the cooling-water circuit is fully sealed, target replacement does not require another leak test. - Gas Distribution System
Process gas is fed from both sides of the cathode. Main and trim flows are separately controlled for uniform gas coverage across the target surface.
Technical Specifications
| Target Size | Customized according to coating line specifications |
| Planar Cathode Target Utilization | ≥33% |
| Single-Layer Film Uniformity | ≤1.6% |
| Target-to-Substrate Distance | Customizable |
| Target Materials | Ag, NiCr, Cu, Al, and other metals |
| Magnetic Field Adjustment | Atmospheric adjustment / manual adjustment under vacuum / online adjustment under vacuum |
FAQ
- What target size can the planar cathode accommodate? Can it be customized for different glass widths?
There is no fixed target size. The target dimensions are selected to match the specifications of the coating line. - What are the adjustment range and control accuracy for online magnetic field adjustment under vacuum?
The total adjustment range is ±3 mm, with a control accuracy of 0.1 mm. - What is the maximum sputtering power or power density?
The maximum depends on the target material, and the cathode can operate stably at power densities above 15 kW/cm². - How long does it take to replace the target? Is a leak test required afterwards?
4.The time needed to replace the target depends on different factors, such as the number of technicians involved, how experienced they are, etc. No additional leak test is required after the target is replaced.
CNBM Optoelectronic Equipment (Taicang) Co., Ltd., established in 2009, is a wholly owned subsidiary of China Triumph International Engineering Co., Ltd. (CTIEC). The company specializes in large-area magnetron sputtering coating equipment, with Low-E glass coating lines as its core business. Its 100,000 m² manufacturing base includes an R&D center and nearly 20,000 m² of assembly and commissioning facilities. The company provides equipment R&D, engineering design, manufacturing, installation, commissioning, training and system upgrades. Its coating lines support single-, double- and triple-silver Low-E glass, solar-control glass and other functional coatings. More than 20 Low-E coating lines have been delivered and put into commercial operation. Projects are supplied as complete coating systems or turnkey solutions according to customers’ glass sizes, coating processes and production requirements.
